摘要
研究了以稳定F-P腔腔长来控制原子沉积台与驻波光场之间相对位置的稳定性。在简要分析F-P腔工作原理的基础上,设计了F-P腔腔长锁定反馈控制系统。该系统以633nm稳频激光作为基准光源,通过光电转换、调制与解调、比例积分等控制环节,实现了将F-P腔的谐振频率锁定到基准光源的频率上。实验结果表明,锁定后的F-P腔腔长的稳定度达到了10-8以上,可满足原子光刻技术中对沉积台与驻波光场相对位置稳定的应用要求。
A controlling project of the relative position between the deposition platform and the standing electromagnetic wave is presented by stabilizing the Fabry-Perot cavity length.Starting from the working principle of F-P cavity, a Feedback Control System is designed.This system uses photo-electric conversion,modulation and demodulation and PI control to lock the Fabry-Perot cavity's resonance frequency to the 633nm laser's frequency.The experimental results show that the stability of F-P cavity length reaches 10-8,which could meet the application requirements in atom photolithography.
出处
《光学技术》
CAS
CSCD
北大核心
2008年第S1期261-262,264,共3页
Optical Technique
关键词
原子沉积台
驻波光场
F-P腔
压电陶瓷
控制系统
deposition platform
standing electromagnetic wave
Fabry-Perot cavity
piezoelectric ceramics
control system