摘要
The crystallization of NiTi shape memory alloy sputter deposition film in the course of sputtering deposition and that after heat treated were studied. The relationship between the process factors, such as substrate type, temperature, as well as the crystallization when heat treated after plating was investigated. The results show that a new phase precipitates during heat treatment after sputtering deposition and the degree of crystallization among different layers and the stress in grains are obviously different.
The crystallization of NiTi shape memory alloy sputter deposition film in the course of sputtering deposition and that after heat treated were studied. The relationship between the process factors, such as substrate type, temperature, as well as the crystallization when heat treated after plating was investigated. The results show that a new phase precipitates during heat treatment after sputtering deposition and the degree of crystallization among different layers and the stress in grains are obviously different.
出处
《中国有色金属学会会刊：英文版》
CSCD
2000年第3期320-323,共4页
Transactions of Nonferrous Metals Society of China
