摘要
If a plasma system, made of metal and grounded, is used for insulator material deposition, the environment of the plasma will be changed, i.e., the grounded wall will become isolated. Furthermore, the electrical characteristic measurement of the plasma and the bias properties will be largely affected by the wall effect. In this paper we investigate how the electrical characteristics evolve via the insulator deposition in a DECR (Distributed Electron Cyclotron Resonance) plasma system. An equivalent circuit of the wall effects is proposed and used to qualitatively explicate the observed phenomenon about the I-V measurement during the evolution. At the end of the paper, after having understood the properties of the wall effect, an experiment about a plasma anodic oxidation are successfully conducted in the insulator deposition system.
If a plasma system, made of metal and grounded, is used for insulator material deposition, the environment of the plasma will be changed, i.e., the grounded wall will become isolated. Furthermore, the electrical characteristic measurement of the plasma and the bias properties will be largely affected by the wall effect. In this paper we investigate how the electrical characteristics evolve via the insulator deposition in a DECR (Distributed Electron Cyclotron Resonance) plasma system. An equivalent circuit of the wall effects is proposed and used to qualitatively explicate the observed phenomenon about the I-V measurement during the evolution. At the end of the paper, after having understood the properties of the wall effect, an experiment about a plasma anodic oxidation are successfully conducted in the insulator deposition system.
