摘要
The magnetic properties and microstructure of diffusion annealed [Ta/Nd/NdFeB/Nd/Ta]thin films have been investigated. The films were deposited on Si substrate with various thickness ratio of Nd/NdFeB layer (R=0～3.3), then diffused and crystallized by annealing at 650℃ for 10 min. The film without Nd layer showed soft magnetic behavior and high content of a-Fe phase. The films with R > =1 showed good hard magnetic properties with the high coercivity of about 20 kOe.
The magnetic properties and microstructure of diffusion annealed [Ta/Nd/NdFeB/Nd/Ta]thin films have been investigated. The films were deposited on Si substrate with various thickness ratio of Nd/NdFeB layer (R=0～3.3), then diffused and crystallized by annealing at 650℃ for 10 min. The film without Nd layer showed soft magnetic behavior and high content of a-Fe phase. The films with R > =1 showed good hard magnetic properties with the high coercivity of about 20 kOe.
