摘要
The photolysis of uracil in phosphate-buffered saline (PBS, pH 8.0) under the irradiation of medium pressure mercury lamp (MPML) leads to the production of a novel compound C4H5N2O6P. The composition and structure of the compound has been identified by elemental analysis, EI-MS, UV, IR, 1H, 13C, 31P-NMR.
The photolysis of uracil in phosphate-buffered saline (PBS, pH 8.0) under the irradiation pf medium pressure mercury lamp (MPML) leads to the production of a novel compound C4H5N2O6P. The composition and structure of the compound has been identified by elemental analysis, EI-MS, UV, IR, H-1, C-13, P-31-NMR.
