下一代光刻技术展望

Prospect of the Next Generation Lithography

介绍了下一代光刻技术的技术要点，国外研究概况和进展。重点讨论了极紫外（软Ｘ射线）光刻、电子束光刻和离子束光刻技术的进展，提出了我国开展下一代光刻技术研究的技术路线。

This paper describes technologies of the Next Generation Lithography (NGL)and their research activities and technical developments going on at present in the world.It pays stresses on the technologies of extreme ultraviolet lithography, the scattering withangular limitation projection electron-beam lithography (SCALPEL) and ion projectionlithography. Some technical route suggestions for researching and implementing future ICmicrofabrication equipment in our country are given in the paper.