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Modulated Quasi-plane Tunneling Current

Modulated Quasi-plane Tunneling Current
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摘要 A new tutmeling junction can be formed by an insulator layer inserting into a quantum well, and in the quantum well, a quasi-plane tunneling current can be formed by applying a tunneling voltage. If a P-N junction is grown on the quantum well, the tunneling current can be modulated by a P-N junction-bias voltage. The modulated quasi-plane tunneling current is not only related to the bias voltage, but also to the depth of the quantum well. It is analyzed that the P-N junction-bias voltage how to affect the tunneling current and a method of measuring the depth of the quantum well is presented. A new tutmeling junction can be formed by an insulator layer inserting into a quantum well, and in the quantum well, a quasi-plane tunneling current can be formed by applying a tunneling voltage. If a P-N junction is grown on the quantum well, the tunneling current can be modulated by a P-N junction-bias voltage. The modulated quasi-plane tunneling current is not only related to the bias voltage, but also to the depth of the quantum well. It is analyzed that the P-N junction-bias voltage how to affect the tunneling current and a method of measuring the depth of the quantum well is presented.
出处 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 1999年第1期44-46,共3页 矿物冶金与材料学报(英文版)
关键词 quantum well tunneling current semiconductor device quantum well tunneling current semiconductor device
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