摘要
本文用XRD和SEM等分析测试手段,详细研究了Sol-Gel法不同工艺过程制得KTN薄膜样品的结构和形貌。发现KTN薄膜的结构和形貌主要受热处理工艺的烧结温度、升降温速率、烧结气氛等影响,详细分析讨论了产生这些影响的原因。在SrTiO3(100,111)基片上制备出了高取向、纯钙钛矿结构、表面形貌良好的KTN薄膜。
The structure and surface morphology of KTN thin films derived from Sol-Gel method in different heat-treatment conditions werc studied by XRD and SEM, the results indicated that they were in-fluenced heavily by the tcchnical parameters of heating and cooling rate,crystallization temperature and atmosphere. The effect of heat-trerat-ment process was analysed and discusscd, highly oriented perovskite KTN thin films were prepared on SrTiO3 (100, 111)substrates.
出处
《十堰职业技术学院学报》
1999年第2期5-13,共9页
Journal of Shiyan Technical Institute