摘要
Low energy hydrogen ion was used to passivate the electrically active defects existing in grains and grain boundaries of polycrystalline silicon solar cells.Short circuit current of H + implanted cells remarkably increased before and after preparing TiO 2AR(antireflective)coating.The measurements(at λ=6328) of the optical properties of H + implanted silicon samples show that:the value of absorption coefficient reached the level of a Si;refractive index n and reflectivity R significantly decreased;the optical band gap increased from 1.1 eV to 1.3 eV.The results indicate that Si H bonds have been formed after H + implantation.The calculation shows that the optical thickness cycle of TiO 2 AR coating will reduce correspondingly in order to obtain the optimum optical match between AR coating and implanted silicon since refractive index decreases after H + implantation.
Low energy hydrogen ion was used to passivate the electrically active defects existing in grains and grain boundaries of polycrystalline silicon solar cells.Short circuit current of H + implanted cells remarkably increased before and after preparing TiO 2AR(antireflective)coating.The measurements(at λ=6328) of the optical properties of H + implanted silicon samples show that:the value of absorption coefficient reached the level of a Si;refractive index n and reflectivity R significantly decreased;the optical band gap increased from 1.1 eV to 1.3 eV.The results indicate that Si H bonds have been formed after H + implantation.The calculation shows that the optical thickness cycle of TiO 2 AR coating will reduce correspondingly in order to obtain the optimum optical match between AR coating and implanted silicon since refractive index decreases after H + implantation.
