散粒磨粒抛光运动轨迹的仿真与合理参数的选择

Simulation of Machining Trace and Alternation of Proposed Parameters in the Lose Abrasive Polishing *

通过计算机模拟出磨粒的运动轨迹，从而得出影响抛光质量的因素，并提出了合理的抛光运动参数。

In this paper, abrasive machining trace has been simulated by computer in which we have obtained the factors influencing on polished surface quality of parts, and proposed optimium polishing parameters.