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Fabrication of Diffraction-limited Full Aperture Microlens Array by Melting Photoresist

Fabrication of Diffraction-limited Full Aperture Microlens Array by Melting Photoresist
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摘要 A further study on the fabrication of diffraction--limited full aperture microlens array by melting photoresist is described. The formation of aspherical surface is considered. The parameters for controlling the process of lens production, the height of original photoresist cylinders and the angle of contact between the melted photoresist and the substrate, are discussed in detail. The diffraction limited full--aperture microlens arrays have been obtained,and some measurement results are shown in the paper. A method of controlling the formation of quality microlens array in real time is suggested. A further study on the fabrication of diffraction-limited full aperture microlens array by melting photoresist is described. The formation of aspherical surface is considered. The parameters for controlling the process of lens production, the height of original photoresist cylinders and the angle of contact between the melted photoresist and the substrate, are discussed in detail. The diffraction limited full-aperture microlens arrays have been obtained, and some measurement results are shown in the paper. A method of controlling the formation of quality microlens array in real time is suggested.
作者 高应俊
出处 《High Technology Letters》 EI CAS 1997年第1期5-9,共5页 高技术通讯(英文版)
关键词 MICROLENS array MELTING PHOTORESIST Diffraction-limited Microlens array, Melting photoresist, Diffraction-limited
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