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FABRICATION OF HIGH-MELTING POINT METAL COATING 被引量：3

FABRICATION OF HIGH MELTING POINT METAL COATING
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摘要 ＦＡＢＲＩＣＡＴＩＯＮＯＦＨＩＧＨＭＥＬＴＩＮＧＰＯＩＮＴＭＥＴＡＬＣＯＡＴＩＮＧ①ＴａｎｇＢｉｎ，ＨｕＸｉｎｆａｎｇ，ＸｕＫｅｗｅｉＳｃｈｏｏｌｏｆＭａｔｅｒｉａｌｓＳｃｉｅｎｃｅａｎｄＥｎｇｉｎｅｒｉｎｇ，Ｘｉ′ａｎＪｉａｏｔｏｎｇＵｎｉｖｅｒ... A new multiple hollow cathode sputtering target which has a simple configuration and a high sputtering rate was developed. Parameters of discharge and coating were studied. The results indicate that the current density and sputtering rate depend on the working pressure, target voltage and configuration. When H·D -1 is 2～3, the target has an efficient sputtering rate. The optimum negative bias voltage is 200～300 V for Mo coating.
作者 Tang Bin, Hu Xinfang, Xu Kewei School of Materials Science and Engineering, Xi′an Jiaotong University, Xi′an 710049 Wang Congzeng Research Institute of Surface Engineering, Taiyuan Polytechnic University, Taiyuan 030024
出处 《中国有色金属学会会刊：英文版》 CSCD 1997年第4期89-92,共4页 Transactions of Nonferrous Metals Society of China
关键词 multiple HOLLOW cathode SPUTTERING target COATING high MELTING POINT METAL multiple hollow cathode sputtering target coating high melting point metal
分类号 TG113.12 [金属学及工艺—物理冶金]
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  • 2王海斗,徐滨士,刘家浚,庄大明.金属钼层表面渗硫层的表征与减摩耐磨性能研究[J].稀有金属材料与工程,2005,34(10):1513-1516. 被引量：8
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二级引证文献11

中国有色金属学会会刊：英文版
1997年 第4期

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