抛光力对光学玻璃表面抛光质量的影响

分析与测量了抛光模与工件盘之间的抛光力，并对如何控制与测量进行了研究．研究结果表明，随着抛光模与工件之间接触压力的增大，面型精度及表面粗糙度将变差，并且工件盘上各点切向力的变化将会引起抛光去除量不相同，因而也会导致面型精度的下降．

This paper deals with the analysis and measurement of applied foroes between polishing plate and work holder,and makes an investigation on how to control and measure the polishing force.It has been Shown that the profile accuracy and the surface roughness of polished workpiece will be poorer and poorer with the increasing of contact pressure between polishing plate and workpiece,and that the removal amount differences caused by the variations of tangtial forces on the work holder will lead to the decrease of profile accuracy.