超光滑表面清洗技术的最新进展

分析起光滑表面清洗技术所面临的问题和发展现状，介绍先进清洗技术的清洗机理、工作原理和基本实现方法，旨在促进这些新技术的研究和应用，使以超光滑表面为代表的半导体工业、微电子工业在高洁净表面清洗技术上得到进一步发展．

In this Paper, the difficulties and devepment situations of the cleaning techniques for super- smoothsurfaces have been presented. Mechanisms, principles and implementation methods of advanced cleaning techniqueshigh-clean surface deaning techniques for serniconductor industry and microelectronic industry, in which the super-smooth surfaces are typically used.