硅多次掩膜各向异性腐蚀掩膜版的计算机辅助设计

Computer Aid Designing for Mask of Silicon Multi-mask Anisotropic Etching

研究了硅的多次掩膜各向异性腐蚀过程，提出了多次掩膜各向异性腐蚀掩膜版计算机辅助设计的方法。

Anisotropic etching technique is an important technique in micro-machine and micro-optic. Multi-mask anisotropic etching can get some shapes which can not get with one-mask etching. The designing of the mask used in multi-mask anisotropic etching is very difficult. This paper present a method for computer aid designing of mask use in multi-mask anisotropic etching. It makes the designing of the mask easy and fast.