PLD非晶碳－聚酰亚胺复合薄膜的场致电子发射

FIELD ELECTRON EMISSION FROM AMORPHOUS CARBON-POLYIMIDE COMPOSITE FILMS PREPARED BY PULSED LASER DEPOSITION

利用脉冲激光沉积技术在高电导率衬底上，制备了非晶碳－聚酰亚胺复合薄膜，首次观察到非晶碳－聚酰亚胺复合薄膜具有较低的电子发射阈值电场和较高的发射电流密度．利用透明导电阳极技术，确定阴极电子发射位置。

The lower turn-on electrical field and higher current density wis firstly obtained from amorphous carbon-polyimide films deposited on silicon substrate with high electrical conductivity by pulse laserd deposition. The locations of electron emission sites wie observed using transparent conducting anode techanique And the effect of surface microstructure on electron emission can be futher understood.