摘要
本文介绍了用微波ＣＶＤ技术沉积金刚石薄膜的设备和工艺条件，同时对金刚石薄膜的场致发射进行了初步研究。
The chemical vapor deposition(CVD) system and experimental conditions for diamond thin films wis reported.Field electron emission from the diamond thin films wis studied And a surface morphology of films suillig to be better emitter was obtained.
出处
《郑州大学学报（理学版）》
CAS
1996年第S2期46-48,共3页
Journal of Zhengzhou University:Natural Science Edition
关键词
微波CVD技术
场致发射
金刚石薄膜
金刚石镶嵌
非晶碳膜
microwave chemical vapor deposition
field electron emission
diamond thin films
diamond-carbon
thin film
