摘要
Hydrogenated nanocrystalline silicon films (nc-Si:H) are a developing novel man-made functional semiconductor material in recent years. Their strange microstructure and physical properties of nc-Si:H films are attracting our attention. We have used the conventional structure analysis procedures, such as X-ray diffraction pattern, Raman scattering spectrum, high resolution transmission electron microscopy (HREM), and the scanning tunnelling microscope (STM), to analyze their microstructure. Since Mandelbrot proposed the fractal theory in 1982, it has become a quantitatively characterizing means to distinguish the microstructure morphology of materials. Recently, the fractal
基金
Project supported by the National Natural Science Foundation of China.