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Fractal characteristics of surface morphology for hydrogenated silicon films

Fractal characteristics of surface morphology for hydrogenated silicon films
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摘要 Hydrogenated nanocrystalline silicon films (nc-Si:H) are a developing novel man-made functional semiconductor material in recent years. Their strange microstructure and physical properties of nc-Si:H films are attracting our attention. We have used the conventional structure analysis procedures, such as X-ray diffraction pattern, Raman scattering spectrum, high resolution transmission electron microscopy (HREM), and the scanning tunnelling microscope (STM), to analyze their microstructure. Since Mandelbrot proposed the fractal theory in 1982, it has become a quantitatively characterizing means to distinguish the microstructure morphology of materials. Recently, the fractal
出处 《Chinese Science Bulletin》 SCIE EI CAS 1996年第19期1659-1665,共7页
基金 Project supported by the National Natural Science Foundation of China.
关键词 micro-crystalline SILICON FILMS NANO-CRYSTALLINE SILICON FILMS FRACTAL morphology. micro-crystalline silicon films nano-crystalline silicon films fractal morphology
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