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Influence of oxygen on photoluminescence of erbium-implanted silicon

Influence of oxygen on photoluminescence of erbium-implanted silicon
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摘要 The luminescence of silicon doped with trivalent rare earth erbium at about 1.54μmhas attracted considerable attention in recent years, because this emission corresponds tothe minimum attenuation of silica glass fibers and presents the possibilities of integratingelectrical and optical circuits fabricated in silicon-based materials with the maturemanufacturing technology of silicon. Recently it was observed that the presence of
出处 《Chinese Science Bulletin》 SCIE EI CAS 1996年第2期105-109,共5页
基金 Project supported by the National Natural Science Foundation of China and the Chinese Academy of Sciences.
关键词 IMPLANTATION ERBIUM PHOTOLUMINESCENCE oxygen-defect COMPLEX center. implantation erbium photoluminescence oxygen-defect complex center
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