摘要
简要分析具有势垒层结构的非晶硅碳薄膜发光二极管(a—SiCx:HTFLED)发光特性,着重于分析外加偏压下载流子的注入和复合过程,理论上得到二极管发光亮度与外加偏压关系,理论分析与实验结果基本一致。
The paper gins a simple analysis of a-SiCx:H TILED with barrier layer strcuture, and a focus on analysing the process of carier injection and recombination under applied voltage. Based on these, the relationship between diode luminosity and applied voltage is deduced theoretics, and it is in nearly agreement with the experiment results.
出处
《宁波大学学报(理工版)》
CAS
1995年第3期58-62,共5页
Journal of Ningbo University:Natural Science and Engineering Edition
关键词
势垒层
隧道几率
辐射复合效率
发光亮度
arrier layer tunneling probability radiative recombination efficieluminosity