准分子激光选择CVD技术的SnO_2薄膜图形生长及微透镜制作

Figure-growth and Microlens Fabrication of SnO2 Films by Using Excimer Laser CVD Technique

准分子激光ＣＶＤ由于紫外光参与并促进了其源分解，所以对激光光束具有很强的选择性从而可以实现图形转换和直接图形生长，我们利用这一特点在自己建立的准分子激光选择ＣＶＤ系统上得到了ＳｎＯ２薄膜生长速率与激光能量密度间的关系曲线，并玻璃和Ｓｉ衬底上实现了ＳｎＯ２薄膜的宽约８０μｍ条伏和面积１００×１００μｍ２方形图形生长，同时也在Ｓｉ衬底进行了微透镜制作的尝试，获得了半径约４５μｍ近高斯分布的ＳｎＯ２，薄膜，其中心最大厚度约９７０ｍｍ。

Abstract By Using laser-CVD technique,we grow specified light selecting SnO2films,among which:one is strip-like feature with.only 80 μm width,another is in squareoutline whose size is 100×100μm2.Also during our experiment we tried to fabricate a mi-crolens whose radius was about 45μm,highest thickness was 970nm and is near Guass-shape distribution.