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准分子激光原位淀积YBa<sub>2</sub>Cu<sub>3</sub>O<sub>7-x</sub>超导薄膜

in situ Deposition of High T_c Superconducting Thin Film on Silicon Substrate with xcimer Laser
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摘要 利用ZeCl准分子激光在(100)Si基片上原位淀积出ZrO_2缓冲层和YBa_2Cu_3O_(7-x)高T_c超导薄膜,薄膜的零电阻温度为82K.X射线衍射结果表明该超导薄膜具有很强的c轴取向的正交结构。 High T_c superconducting thin film of YBa_2Cu_3O_(7-x) and Zro_2 buffer layer have been de-posited in situ on(100)silicon substrate with excimer laser.The zero-resistance tempera-ture of the film is T_(c0)=88 K. The X-ray diffraction pattern of the film indicates that the film is of orthorhombic phase structure with strong orientation of c-axis perpendicular to the film surface,Deposition of multi-layer film in the same vacuum chamber with excimer laser has alsobeen achieved.
出处 《华中科技大学学报(自然科学版)》 EI CAS CSCD 北大核心 1995年第S2期115-117,共3页 Journal of Huazhong University of Science and Technology(Natural Science Edition)
基金 国家教委基金
关键词 准分子激光 原位淀积 超导薄膜 Si基片 excimer laser Si-substrate superconducting thin film in situ deposition
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