摘要
The alkali-metal Na adsorption on Si(100)2×1 surface and its promoted oxidation and Si oxide growth have been investigated by means of thermal desorption,work function,Auger electron spectroscopy and photoemission electron spectroscopy.The experimental data showed that there was a new state,interface electron state,near the Fermi level after the deposition of Na atoms.It was found that the presence of Na always caused an increase of the oxygen initial uptake whereas the promotion of Si oxide growth was observed only at the coverage of Na greater than 0.5 ML.A new mechanism of Na-promoted Si oxide growth is suggested in this paper.
The alkali-metal Na adsorption on Si(100)2×1 surface and its promoted oxidation and Si oxide growth have been investigated by means of thermal desorption,work function,Auger electron spectroscopy and photoemission electron spectroscopy.The experimental data showed that there was a new state,interface electron state,near the Fermi level after the deposition of Na atoms.It was found that the presence of Na always caused an increase of the oxygen initial uptake whereas the promotion of Si oxide growth was observed only at the coverage of Na greater than 0.5 ML.A new mechanism of Na-promoted Si oxide growth is suggested in this paper.
