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A FACETED DEFECT IN ZMR SOI MATERIALS

A FACETED DEFECT IN ZMR SOI MATERIALS
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摘要 A faceted defect has been found in some ZMR SOI multilayer compositematerials as a result of melting and recrystallization of silicon substrate at some isolat-ed spots of its top in ZMR processing.The temperature deviation tolerance of thermalfield is predicted and,based on it,some suggestions on improving the multilayerstructure design are put forward.Finally,a model interpreting the defect formationis described,which leads to a qualitative explanation of the defect features. A faceted defect has been found in some ZMR SOI multilayer composite materials as a result of melting and recrystallization of silicon substrate at some isolat- ed spots of its top in ZMR processing.The temperature deviation tolerance of thermal field is predicted and,based on it,some suggestions on improving the multilayer structure design are put forward.Finally,a model interpreting the defect formation is described,which leads to a qualitative explanation of the defect features.
作者 郑其经
出处 《Journal of Southeast University(English Edition)》 EI CAS 1993年第2期8-14,共7页 东南大学学报(英文版)
关键词 SILICON RECRYSTALLIZATION DEFECT COMPOSITE MATERIAL silicon recrystallization defect composite material
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