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Preparation and Characterization of Hg_(0.8)Cd_(0.2)Te Epilayers Grown by Hot Wall MOCVD

Preparation and Characterization of Hg_(0.8)Cd_(0.2)Te Epilayers Grown by Hot Wall MOCVD
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摘要 Hg_(1-x)Cd_xTe(CMT)epilayers with corresponding wavelength of 10.6μm(x=0.2)were reproducibly grown on GaAs substrates in a movable hot wall MOCVD reactor.Rather high uniformity of solid compo- sitions was obtained.X-ray diffraction,TEM,DCXD,FTIR and Van der Pauw technique were employed to determine the crystalline,optical and electrical properties of CMT epilayers,which are effectively im- proved as compared with the previous data. Hg_(1-x)Cd_xTe(CMT)epilayers with corresponding wavelength of 10.6μm(x=0.2)were reproducibly grown on GaAs substrates in a movable hot wall MOCVD reactor.Rather high uniformity of solid compo- sitions was obtained.X-ray diffraction,TEM,DCXD,FTIR and Van der Pauw technique were employed to determine the crystalline,optical and electrical properties of CMT epilayers,which are effectively im- proved as compared with the previous data.
出处 《Rare Metals》 SCIE EI CAS CSCD 1993年第3期175-180,共6页 稀有金属(英文版)
关键词 Hot wall MOCVD HgCdTe/CdTe/GaAs structures CdTe/GaAs Buffer layers Optoelectronic properties CMT Hot wall MOCVD HgCdTe/CdTe/GaAs structures CdTe/GaAs Buffer layers Optoelectronic properties CMT
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