摘要
Observation was carried out of the structure of sulphuric,oxalic or phosphoricfilm on Al after treatment of reanodizing and electrolytic depositing lubricant in（NH<sub>4</sub>）<sub>2</sub>MoS<sub>4</sub> solution,as well as of the deposited products by means of EMPA,TEMand energy spectro-scopic analysis.The deposited products are mixture of compounds ofS and Mo rather than single MoS<sub>2</sub> and most of them dcposited near the surface layerof the film.Some regular long pores without barrier layer occurred in the film,but theregular fine channels without relation to the structural element parameters of originalanodized film were found in the thickened barrier layer of phosphoric film.Sulphur maybe remained as Mo sulphide in the film during heating under Ar protective environment.
Observation was carried out of the structure of sulphuric,oxalic or phosphoric film on Al after treatment of reanodizing and electrolytic depositing lubricant in (NH_4)_2MoS_4 solution,as well as of the deposited products by means of EMPA,TEM and energy spectro-scopic analysis.The deposited products are mixture of compounds of S and Mo rather than single MoS_2 and most of them dcposited near the surface layer of the film.Some regular long pores without barrier layer occurred in the film,but the regular fine channels without relation to the structural element parameters of original anodized film were found in the thickened barrier layer of phosphoric film.Sulphur may be remained as Mo sulphide in the film during heating under Ar protective environment.
