由氨解法制备的Si_3N_4粉末的表面元素状态

Surface State of Fine Si3N4 Powders Made from Thermal Decomposition of SilicOn-Imide

用XPS表面分析,研究了由氨解法在不同温度下热解所得的Si_3N_4粉末,并与由硅粉氮化所得的商用Si_3N_4粉末作了比较。由氨解法制备的Si_3N_4粉末其表面存在两种状态的氧:结合状态的氧和吸附态的氧,其表面组成为Si_(2.2-2.7)N_(2.9-3.7)O。由硅粉氮化所制得Si_3N_4其表面也存在两种状态的氧,其表面组成则为Si_(0.8)N_(0.8)O。

Si3N4 powders made from imide process and thermal decomposed at different temperatures have investigated by XPS surface analysis; They were compared with a commercial Si3N4 powder made with nitridation process. Oxygen both in combined form of Si2.2-2.7N2.9_3.7O layer and absorbed form were found on the powder surface, in contrast to Si0.8 N0.8O layer and absorbed form in the case of Si3N4 powders made from Si aitridation.