AES定量分析中离子溅射修正的实验研究

EXPERIMENTAL STUDY OF ION SPUTTERING CORRECTON IN THE QUANTITATIVE AES ANALYSIS

在俄歇电子谱(AES)定量分析中,离子溅射是最常用的表面清洁手段。我们在常规的实验条件下,用AES分析了AgCu、NiCr、CuZa和TiMo合金经低能Ar^+离子轰击后表面成分的变化。用不同的离子溅射理论修正关系修正后发现,在减小离子诱导偏析和增强扩散的条件下,采用Shimizu的修正关系和Sigmuad的级联溅射产额比关系可得到误差较小的定量分析结果。文中对各种修正理论的误差进行了讨论,认为提出的修正措施及方法对实际定量AES分析精度的提高具有一定的意义。

Ion sputtering cleaning of the solid surface is one of the most generally used method in Auger Electron Spectroscopy (AES) analysis. The surface composition changes of the alloys, AgCu, NiCr, CuZn and TiMo, which are bombarded by low energy Ar^+, have been studied by means of AES. The surface compositions are corrected by different correction models. We find that there is a small deviation in the correction result by using the Shimizu's correction model and the Sigmund's sputtering yield ratio relationship under the condition of reducing the ion induced segregation and enhancing the deffusion effects. The difference of the theoreticnl sputtering correction results and the experimental results are discussed.