用于软X光反射镜的Ni/C、Mo/Si多层膜的制备

PREPARATION OF Ni/C、Mo/Si MULTILAYERS USED FOR SOFT X-RAY MIRRORS

本文介绍了用石英晶体振荡膜厚速率监控法,制备用于软X光反射镜的Ni/C、Mo/Si多层膜的工艺过程。制备了一系列周期厚度45—75(?),层数多至50层的多层膜样品,并利用X光小角衍射(Cu kα线:1.54(?))、俄歇电子能谱(AES)、透射电子显微镜(TEM),测试和分析它们的周期结构、界面状况、膜层内各元素包括杂质的成分分布,最后对所设计的Mo/Si膜系做了软X光反射特性的理论模拟计算。

In this paper, we described the fabrication process of Ni/C, Mo/Si miltilayers used for soft X-ray mirrors, monitored by Quatz Crystal Sensor. Using the X-ray diffraction at law angle, AES and TEM, we measured and analyzed their periodic structure, interfaces and the components profile including the contaminations. We calculated the reflectivity of a Mo/Si multilayer and it shows that we can provide good multilayers for soft X-ray mirrors. The structure has a periodic thickness 45(?)-75(?), up to nearly 50 layers.