直流磁控溅射(Ti、Al)N硬化膜的研制

A STUDY OF (Ti,Al)N HARD FILMS BY DC MAGNETRON SPUTTERING

本文介绍单靶直流磁控溅射三元复合(Ti,Al)N硬化膜的研制结果。制得的Ti_(0.5)Al_(0.5)N腹具有(111)面择优取向Bl NaCl立方结构,显微硬度达到2700kg/mm^2,并具有良好的抗氧化性和抗酸腐蚀性。文中着重讨论了沉膜过强中氮分压、基片负偏压以及基片温度对薄膜显微硬度、形貌、晶粒尺寸和晶格常数的影响。

Ternary (Ti. Al)N hard films have been deposited on the high speed steel substrates by DC mngaetron sputtering from a single Ti, Al target. The Ti_(0·5) Al_(0·5) N films, with a Bl NaCl structure and a (111) prefered orientation, were found to have a microhardness of 2700 kgf/mm^2, a good oxidation resistance and anti-acid corrosion. The influenceof Nitrogen partial pressure, substrate bias and temperature oa microhardness, microstructure, grain size and lattice constant of the films, was discussed in the paper.