摘要
本文主要阐述了标准物质SiO_2的制备与研究以及用AES测定其界面宽度时的各种影响因素。文献综述了三种界面宽度的计算方法和修正因子,并指出了各自的优缺点。
This paper describes the development of a standard reference material-SiO_2 and different influence factors in the interface width measurement by AES. Three computing methods and correcting factors are summarized, and their merits and demerits are indicated, respectively.
出处
《真空科学与技术学报》
EI
CAS
CSCD
1990年第6期397-401,共5页
Chinese Journal of Vacuum Science and Technology