电子能谱二氧化硅标准物质的研制

DEVELOPMENT OF A STANDARD REFERENCE MATERIAL-SiO_2 FOR AES AND XPS

本文主要阐述了标准物质SiO_2的制备与研究以及用AES测定其界面宽度时的各种影响因素。文献综述了三种界面宽度的计算方法和修正因子,并指出了各自的优缺点。

This paper describes the development of a standard reference material-SiO_2 and different influence factors in the interface width measurement by AES. Three computing methods and correcting factors are summarized, and their merits and demerits are indicated, respectively.