不同非平衡度磁场环境中溅射等离子体的诊断与分析

Diagnosis and Simulation of Sputtering Plasma Distributions in Two Different Unbalanced Magnetic Fields

采用Langmuir探针对两种不同非平衡度磁场环境中(K值分别为2.78和6.41)的溅射等离子体进行诊断,并使用高斯仪测量靶材表面的磁感应强度,结合靶材表面磁场分布的Ansys软件模拟,分析了等离子体在非平衡磁场环境中的运动规律。结果表明:磁控阴极内侧(靶材表面中部)的溅射等离子体主要参数(离子密度、电子密度及电子温度)在两种不同非平衡度磁场中都具有随靶基距增大而逐渐减小的趋势,大量带电粒子从磁控阴极外端向远离靶材表面的区域运动;K为2.78时的等离子体参数在靶材表面的刻蚀环正上方60 mm范围内明显高于K为6.41时,前者靶材表面的磁感应强度大于后者;向外发散的磁力线数量随K值的增大而增多。

The sputtering plasma distributions in the two different unbalanced magnetic fields（K=2.78 and 6.41,respectively） were diagnosed,and simulated with a software package ANSYS.The impacts of target-substrate separation on the characteristics of the plasma were evaluated.The results show that in the different magnetic fields,the target-substrate distance significantly affects the plasma properties,including the ion density,density and temperature of electrons,especially inside the magnetron（over the middle surface of the target）.So,a large number of the charged-particles transport from the magnetron to the areas far away from the target.In a space 60 mm above the etched-ring of the target,the plasma parameters in the K=2.78 field were found to be markedly higher than those in the K=6.41 field,where there existed lower magnetic inductions above the target surface.Besides,the number of the divergent magnetic lines increases with an increase of K-value.