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射流抛光材料去除机理及影响因素分析 被引量:8

Material removal mechanism and influence factor of fluid jet polishing
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摘要 采用Fluent软件对射流抛光材料去除机理进行了流体动力学仿真研究,通过对射流流场压力、速度和工件表面剪切力的分析可知材料去除量应与表面剪切力的分布相对应,去除函数呈现W型;随后采用正交法对入射速度、工作距离和磨料浓度等工艺参数对抛光效果的影响进行了综合分析,结果表明:去除效率随入射速度和磨料浓度的增大而增大,随工作距离增大而减小,并且工作距离对去除率具有显著影响,为实验研究中工艺参数的选取提供了一定的指导意义。 Fluid dynamics simulation of fluid jet polishing material removal mechanism was studied base on the Fluent software,and the pressure,velocity and wall shear stress of the flow were analyzed.It indicates that the material removal rate is dependent on the distribution of surface shear stress,and the removal function presents W type.The influence of the entrance velocity,operation distance and abrasive concentration on the polishing result was analyzed by using orthogonal test,the result shows that the material removal rate increases with the increase of the incident velocity and abrasive concentration,it decreases as the operation distance increases,and the operation distance has a significant impact on the removal rate.This work can be used for choosing process parameters in process investigation.
出处 《应用光学》 CAS CSCD 北大核心 2011年第6期1206-1211,共6页 Journal of Applied Optics
基金 国家科技重大专项项目(2009ZX02205)
关键词 光学加工 射流抛光 材料去除 流体动力学 正交试验 optical fabrication fluid jet polishing material removal fluid dynamics orthogonal test
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