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A Photosensitive Copolymer for UV-curable Electrodeposition Coatings

A Photosensitive Copolymer for UV-curable Electrodeposition Coatings
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摘要 A series of photosensitive random copolymers (UPDHES) were prepared by introducing acrylate groups onto the side chain of the copolymer backbone of N, N-domethyl amimethyl methacrylate (DMAEMA), 2-hydroxypropyl acrylate (HEA), 2-ethylhexyl acrylate (EHA), and styrene (St) (PDHES). The molecular structure of UPDHES was characterized by FTIR, 1HNMR and GPC. The photopolymerization kinetics of UPDHES with different C=C content was investigated using real time FTIR in which it was found that the UPDHES system had notable photosensitivity. The effect of C=C content on the properties of cured films were studied by evaluating various film properties such as thermal stability, glass transition temperature and tensile properties. The thermal degradation of cured films was investigated via thermogravimetric analysis/infrared spectrometry (TGA-IR). Thus a series of UV-curable electrodeposition coatings with good photosensitivity and mechanical properties were prepared from a low-cost photosensitive random copolymer. A series of photosensitive random copolymers (UPDHES) were prepared by introducing acrylate groups onto the side chain of the copolymer backbone of N, N-domethyl amimethyl methacrylate (DMAEMA), 2-hydroxypropyl acrylate (HEA), 2-ethylhexyl acrylate (EHA), and styrene (St) (PDHES). The molecular structure of UPDHES was characterized by FTIR, 1HNMR and GPC. The photopolymerization kinetics of UPDHES with different C=C content was investigated using real time FTIR in which it was found that the UPDHES system had notable photosensitivity. The effect of C=C content on the properties of cured films were studied by evaluating various film properties such as thermal stability, glass transition temperature and tensile properties. The thermal degradation of cured films was investigated via thermogravimetric analysis/infrared spectrometry (TGA-IR). Thus a series of UV-curable electrodeposition coatings with good photosensitivity and mechanical properties were prepared from a low-cost photosensitive random copolymer.
作者 刘仁 刘晓亚
出处 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2011年第6期1098-1102,共5页 武汉理工大学学报(材料科学英文版)
基金 Funded by the National Natural Science Foundation of China (50673038 and 20704017) the Innovation Foundation of Jiangsu(BY2011118)
关键词 UV-CURABLE electrodeposition coatings PHOTOSENSITIVITY UV-curable electrodeposition coatings photosensitivity
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