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Improving the field-emission properties of carbon nanotubes by magnetically controlled nickel-electroplating treatment

Improving the field-emission properties of carbon nanotubes by magnetically controlled nickel-electroplating treatment
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摘要 A novel magnetically controlled Ni-plating method has been developed to improve the field-emission properties of carbon nanotubes (CNTs). The effect of the magnetic field and Ni-electroplating on CNT field-emission properties was investigated, and the results are demonstrated using scanning electron microscopy, J-E and the duration test. After treatment, the turn-on electric field declines from 1.55 to 0.91 V/μm at an emission current density of 100μA/cm2, and the emission current density increases from 0.011 to 0.34 mA/cm2 at an electric field of 1.0 V/μm. Both the brightness and uniformity of the CNT emission performance are improved after treatment. A novel magnetically controlled Ni-plating method has been developed to improve the field-emission properties of carbon nanotubes (CNTs). The effect of the magnetic field and Ni-electroplating on CNT field-emission properties was investigated, and the results are demonstrated using scanning electron microscopy, J-E and the duration test. After treatment, the turn-on electric field declines from 1.55 to 0.91 V/μm at an emission current density of 100μA/cm2, and the emission current density increases from 0.011 to 0.34 mA/cm2 at an electric field of 1.0 V/μm. Both the brightness and uniformity of the CNT emission performance are improved after treatment.
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第12期456-460,共5页 中国物理B(英文版)
基金 Project supported by the National High Technology Research and Development Program of China (Grant No. 2008AA03A313) the Natural Science Foundation of Fujian Province of China (Grant No. 2009J05145)
关键词 carbon nanotubes magnetic field field emission Ni-electroplate carbon nanotubes, magnetic field, field emission, Ni-electroplate
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参考文献28

  • 1Iijima S 1991 Nature 354 56.
  • 2Li Y, Zhu C and Liu X 2002 Diamond Relat. Mater. 11 1845.
  • 3Shi Y, Zhu C C, Wang Q and Li X 2003 Diamond Relat. Mater. 12 1449.
  • 4Li J, Lei W, Zhang X, Zhou X, Wang Q, Zhang Y and Wang B 2003 Appl. Surf. Sci. 220 96.
  • 5Dai J F, Mu X W, Qiao X W, Chen X T and Wang J H 2010 Chin. Phys. B 19 057201.
  • 6Bai X, Zhang G M, Wang M S, Zhang Z X, Yu J, Zhao X Y, Guo D Z and Xue Z Q 2009 Chin. Phys. B 18 3517.
  • 7Zhang Y, Cao J X and Yang W 2008 Chin. Phys. B 17 1881.
  • 8Song L, Liu S, Zhang G M, Liu L F, Ma W J, Liu D F, Zhao X W, Luo S D, Zhang Z X, Xiang Y J, Shen J, Zhou J J, Wang G and Zhou W Y 2006 Chin. Phys. 15 422.
  • 9Jung M, Eun K Y, Lee J K, Baik Y J, Lee K R and Park J W 2001 Diamond Relat. Mater. 10 1235.
  • 10Lee C J, Park J, Huh Y and Lee J Y 2001 Chem. Phys. Lett. 343 33.

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