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退火对二氧化钛薄膜光学性能的影响 被引量:5

The Effect of Annealing on the Optical Properties of TiO_2 Thin Films
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摘要 采用改进的溶胶-凝胶(sol_gel)法在载玻片上制备了TiO2薄膜。对TiO2干凝胶粉末进行了差热分析(DTA);用分光光度计测试了TiO2薄膜500℃退火前后的透射谱,采用"包络法"计算了TiO2薄膜的折射率、厚度和带隙。结果表明:当波长从700nm减小到400nm时,薄膜的折射率从1.465增加到1.485。退火前后TiO2薄膜的厚度分别为595.836nm和652.4547nm。未退火TiO2薄膜的光学带隙为3.85eV,500℃退火后TiO2薄膜的光学带隙为3.67eV。与未退火薄膜相比,500℃退火后TiO2薄膜的吸收边出现了"红移",光响应区范围变大,提高了可见光的利用率。 A TiO2 film was prepared on the glass slide by a modified sol-gel method.The TiO2 powder was analyzed by DTA.The transmission spectra of the film without annealing and after 500 ℃ annealing were tested by spectrophotometer,and the refractive index,thickness and band gap of the film were calculated using envelope method.The results show that the refractive index increases from 1.465 to 1.485 when the wavelength decreases from 700 nm to 400 nm.The thickness of the film without and after 500 ℃ annealing is 595.836 nm and 652.454 7 nm,respectively.The band gap of the film without annealing is 3.85 eV,and that after 500℃ annealing is 3.67 eV.Compared with the film without annealing,the absorption boundary of the film after 500 ℃ annealing has a red shift,and the light response area is enlarged,which increases the utilization ratio of visible light.
作者 王军 谢亚楠
出处 《绝缘材料》 CAS 北大核心 2011年第6期40-42,47,共4页 Insulating Materials
基金 江西科技师范学院科研项目(KY2010ZZ03)
关键词 TIO2薄膜 溶胶-凝胶法 DTA分析 透射谱 TiO2 film sol-gel method DTA analysis transmission spectra
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  • 1张君善,郭林肖,高斐,刘晓静,宋美周,李宁.CuO薄膜的制备及其光伏特性[J].光子学报,2012,41(6):700-703. 被引量:3
  • 2闫金良,赵银女.Cu掺杂Ga_2O_3薄膜的光学性能[J].光子学报,2012,41(6):704-707. 被引量:7
  • 3孟凡明,周明飞,宋学萍,孙兆奇.退火温度对TiO_2薄膜结构与光学性能的影响[J].功能材料,2007,38(11):1773-1776. 被引量:3
  • 4杨玉旺,刘敬利,张磊,许岩,戴清.TiO_2光催化处理含甲基橙微污染水的动力学研究[J].工业水处理,2007,27(12):31-33. 被引量:11
  • 5Fujishima A,Honda K.Electrochemical Photolysis of Water at a Semiconductor Electrode[J].Nature,1972,238(5358):37-38.
  • 6Hoffmann M R,Martin S T,Choi W Y,et al.Environmental Applications of Semiconductor Photocatalysis[J].Chem Rev,1995,95(1):69-96.
  • 7Linsebigler A L,Lu G Q,Yates J T.Photocatalysis on Ti O2Surfaces-Principles,Mechanisms,and Selected Results[J].Chem Rev,1995,95(3):735-758.
  • 8Dagur P,Mane A U,Shivashankar S A.Thin Films of VO2on Glass by Atomic Layer Deposition:Microstructure and Electrical Properties[J].Journal of Crystal Growth,2005,275(1):1223-1228.
  • 9Hyun Ook Seo,Chae Won Sim,Kwang-Dae Kim,et al.Nanoporous Ti O2/Si O2Prepared by Atomic Layer Deposition as Adsorbents of Methylene Blue in Aqueous Solutions[J].Chemical Engineering Journal,2012,183:381-386.
  • 10Sato J,Kobayashi H,Inoue Y.Photocatalytic Activity for Water Decomposition of Indates with Octahedrally Coordinated d10Configuration.II.Roles of Geometric and Electronic Structures[J].Phys Chem,2003,B107(31):7970-7975.

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