摘要
目前国内多晶硅生产中,还原炉多采用高电压击穿的方式启动,但国外多晶硅生产中多采用低电压击穿,一些进口还原炉采用了低电压启动的结构设计。现本文将以MSA还原炉为例,分析阐述满足低压启动还原炉改成高压启动条件,对炉体结构的改造方案。
The high voltage startup is used in our current domestic polysilicon CVD reactor production, but the polysilicon production abroad has adopted the low voltage startup, so, some imported CVD Reactor are designed with low voltage startup. This thesis will make the CVD Reactor manufactured by MSA Company for an example, and analyze and state how to reform the CVD Reactor furnace structure to make the low voltage sturtup transformed to high voltage startup.
出处
《江西化工》
2011年第4期183-184,共2页
Jiangxi Chemical Industry
关键词
多晶硅
还原炉
低压启动
高压启动
爬电距离
Polysilicon, CVD Reactor Low Voltage Startup High Voltage Startup Creepage Distance