期刊文献+

大晶粒多晶硅铸锭生长的热场设计与模拟 被引量:22

Thermal System Design and Simulation for Growth of Large Grain Multi-crystal Silicon Ingot
下载PDF
导出
摘要 为了生长大晶粒的多晶硅铸锭,晶体从形核到后续生长的热场环境控制至关重要。本文首先在侧加热器与散热块之间加一可移动的隔热环。通过向上移动隔热环,并在底部喷射氩气冷却,对生长工艺进行优化控制。然后利用数值模拟,对改进后的生长界面形状、晶体和熔体中的等温线、晶体和熔体的轴向温度分布以及冷却量对生长环境的影响进行分析。模拟结果表明:冷却速率的最佳值在5~15 W/m2之间,且优化后的晶体和熔体中等温线更平坦,晶体轴向温度梯度增大约1.72 K/cm,从而可有效地避免侧壁形核,促进大晶粒的生长,同时提高了生长速率。 In order to grow large grain multi-crystalline silicon in DSS silicon casting, the key process is to control the thermal system for bulk growth. In this study a moving partition block between the side heater and the heat exchanger block is added. By lifting the partition block and adding a jet cooling onthe bottom block, casting process is controlled optimally. Through the numerical simulation, effects of different cooling flux on growth environment are discussed, and then growth interface, isotherm in the melt and crystal, axial temperature distribution in melt and in crystal are modeled. The results indicate:the optimal value of cooling flux is between 5 W/m^2 and 15 W/mE ; for the new design, the isotherms in the melt and crystal become more flat, and the axial temperature gradient in crystal increases about 1.72 K/cm, which are helpful for avoiding nucleation on the crucible wall, obtaining large grain multi-crystal, and also increasing the growth rate.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2011年第6期1602-1606,共5页 Journal of Synthetic Crystals
关键词 多晶硅 隔热环 喷射冷却 数值模拟 multi-crystalline silicon large grain jet cooling numerical simulation
  • 相关文献

参考文献12

  • 1Yang K,Schwuttke G H,Ciszek T F.Structural and Electrical Characterization of Crystallographic Defects in Silicon Ribbons[J].Journal of Crystal Growth,1980,50:301-310.
  • 2Reis I E,Chung J,Park J,et al.Proceedings of the 11 th European Photovoltaic Energy Conference[C].1992,499.
  • 3Fujiwara K,Nakajima K,Ujihara T,et al.In siru Observations of Crystal Growth Behavior of Silicon Melt[J].Journal of crystal growth,2002,243:275-282.
  • 4Fujiwara K,Obinata Y,Ujihara T,et al.In-situ Observations of Melt Growth Behavior of Polycrystalline Silicon[J].Journal of Crystal Growth,2004,262:124-129.
  • 5Fujiwara K,Pan W,Sawada K,et al.Directional Growth Method to Obtain High Quality Polycrystalline Silicon from Its Melt[J].Journal of Crystal Growth,2006,292:282-285.
  • 6Nagashio K,Kuribayashi K.Growth Mechanism of Twin-related and Twin-free Facet Si Dendrites[J].Acta Materialia,2005,53:3021-3029.
  • 7Wang T Y,Hsu S L,Fei C C,et al.Grain Control using Spot Coling in Multi-crystalline Silicon Crystal Growth[J].Journal of Crystal Growth,2009,311:263-267.
  • 8Li T F,Yeh K M,Hsu W C,et al.High-quality Multi-crystalline Silicon (mc-Si) Grown by Directional Solidifcation Using Notched Crucibles[J].Journal of Crystal Growth,2011,318:219-223.
  • 9Teng Y Y,Chen J C,Lu C W,et al.Effects of the Furnace Pressure on Oxygen and Silicon Oxide Distributions during the Growth of Multicrystalline Silicon Ingots by the Directional Solidification Process[J].Journal of Crystal Growth,2011,318:224-229.
  • 10Teng Y Y,Chen J C,Lu C W,et al.The Carbon Distribution in Multi-crystalline Silicon Ingots Grown Using the Directional Solidification Process[J].Journal of Crystal Growth,2010,312:1282-1290.

二级参考文献16

  • 1DUAN Li,KANG Qi.Study on buoyancy convection phenomenon in the crystal growth process[J].Science China(Technological Sciences),2009,52(8):2367-2372. 被引量:3
  • 2Fujiwara K,Pan W,Usami N,et al.Structural properties of directionally grown polycrystalline SiGe for solar cells. Journal of Crystal Growth . 2005
  • 3Yao L Z.Foundation of Crystal Growth. . 1995
  • 4Kuliev A T,Durnev N V,Kalaev V V.Analysis of 3D unsteady melt flow and crystallization front geometry during a casting process for silicon solar cells. Journal of Crystal Growth . 2007
  • 5Dornberger E,Tomzig E,Seidl A,et al.Thermal simulation of the Czochralski silicon growth process by three different models and comparison with experimental results. Journal of Crystal Growth . 1997
  • 6STR Group.CGSim Flow Module Theory Manual 3.11. . 2009
  • 7Y. Y. Teng,J. C. Chen,C. W. Lu.CRYSTALLINE FRONT CONTROL OF GROWING MULTICRYSTALLINE SI INGOTS DURING THE DIRECTIONAL SOLIDIFICATION PROCESS. Proceedings of PVSEC-18 conference . 2009
  • 8K. Fujiwara,a,,W. Pan K. Sawada M. Tokairin N. Usami Y. Nose A. Nomura T. Shishidoa and K. N.Directional growth method to obtain high quality polycrystalline silicon from its melt. Journal of Crystal Growth . 2006
  • 9Kozo Fujiwar,,Yoshikazu Obinat,Toru Ujihar,et al.Grain growth behaviors of polycrystalline silicon during melt growth processes. Journal of Crystal Growth . 2004
  • 10R. Brown.Theory of transport processes in single crystal growth from the melt. . 1988

共引文献2

同被引文献132

引证文献22

二级引证文献40

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部