含氮类金刚石薄膜的力学和摩擦学性能的研究

Mechanical and Tribological Properties of Nitrogenated Diamond-like Carbon Films

利用脉冲等离子体增强化学气相沉积系统沉积了含氮类金刚石碳薄膜.利用X射线光电子能谱和红外光谱分析了薄膜的化学键状态,在UMT摩擦磨损试验机上考察了薄膜的摩擦学性能,利用扫描电子显微镜分析了摩擦对偶球表面的转移膜形貌.结果表明:随着薄膜中氮含量的增加,薄膜中的sp2C含量增加,硬度有所降低,薄膜的平均摩擦系数先减小后增加.

Nitrogenated diamond-like carbon films were deposited onto Si substrates by Pulse-DC Plasma Enhanced Chemical Vapor Deposition（PECVD） system.X-ray Photoelectron Spectroscopy（XPS）,Fourier Transform Infrared（FTIR） spectrometer and Scanning Electron Microscope（SEM） were utilized to characterize bond configuration and chemical state of the films.Tribological properties were tested on a UMT reciprocating tribometer.As the nitrogen content of carbon nitride films increased,the sp2 C content increased and the hardness decreased,while the average coefficient of friction of carbon nitride films increased.