磁控溅射和退火制备ZnO/SiO_2复合薄膜

ZnO/SiO_2 composite films prepared by magnetron sputtering and annealing

采用射频磁控溅射和退火处理的方法在单晶硅衬底上制备了ZnO/SiO2复合薄膜,利用X射线衍射(XRD)、扫描电镜(SEM)、能谱分析(EDS)和接触角测量等测试手段研究溅射气压、溅射功率、氧氩比和退火温度等对复合薄膜成分组成、组织结构及润湿性能的影响。研究表明,复合薄膜中主要有ZnO、SiO2、Zn2SiO4 3种物相,且分别以六方纤锌矿结构、无定形态和硅锌矿型等形式存在。随着溅射和退火工艺的改变,复合薄膜的接触角在41°～146°间变化,组织形态由颗粒状向纳米竹叶状变化。溅射气压0.5 Pa,溅射功率120 W,氧氩比(O2∶Ar)为0∶30,退火温度为700℃的条件下获得具有六方纤锌矿结构的ZnO纳米组织,该组织呈现出竹叶状,在薄膜表面交错排列形成了无序多空隙的微观形貌,使复合薄膜具有超疏水性,接触角为146°。

ZnO/SiO2 composite films were deposited by radio freguency RF magnetron sputtering and annealing technique on Si substrate. Influence of sputtering pressure, sputtering power, ratio of O2/Ar and annealing time on composition, surface morphology and wettability of the composite films were investigated by X-ray diffraction （XRD）and energy dispersive spectrometer （EDS）, scanning electron microscopy （SEM） and contact angle measurement. The results show that ZnO, SiO2 and Zn2 SiO4 with hexagonal wurtzite structure, amorphous structure and willemite structure, respectively, are main phases in the composite films. With the change of sputtering and annealing process, the contact angle of composite films varies between 41°-146°, and microstructure and morphology of the films changes from granular to nano bamboo leaflike shape. Under condition of sputtering pressure of 0.5 Pa, sputtering power of 120 W, annealing temperature of 700 ℃ , ratio of 02： Ar is 0： 30, superior crystallization property is obtained. ZnO nanometer phase with hexagonal wurtzite structure with superior crystallization property is obtained. The ZnO nanometer structure shows bamboo leaf-like shape, staggered arrange on surface of thin films to form disordered micromorphology with many holes. And it makes the composite films having super hydrophobicity,the contact angle is 146°.