纳米金修饰硅纳米线电极阳极溶出法测定痕量铅、铜

Determination of Lead and Copper at Gold Nanoparticles Modified Silicon Nanowires Electrode by Anodic Stripping Voltammetry

以浸入沉积的方法在硅纳米线上修饰了金纳米颗粒,并通过电子扫描显微镜（SEM）和X射线荧光分析（XRF）对金纳米粒子修饰的硅纳米线电极表面形貌进行了表征.以修饰后的硅纳米线电极作为工作电极,采用阳极溶出法检测水中痕量铅和铜,考察pH值、富集电位和富集时间对溶出峰的影响,优化出最佳实验条件.在优化的实验条件下,铅Pb2＋和铜Cu2＋的灵敏度分别为0.649μA/（μg.L-1）和0.177μA/（μg.L-1）.检测极限达到0.26μg.L-1和0.67μg.L-1.峰电流与离子浓度在质量浓度25~200μg.L-1的范围内形成良好的线性关系.

A novel gold nanoparticles modified silicon nanowires（Au/SiNWs） electrode for anodic stripping analysis of lead（Pb2＋） and copper（Cu2＋） under the optimum conditions is described in this paper.Gold nanoparticles has been prepared by immersion plating and grafted to silicon nanowires,the morphology of Au/SiNWs electrode is characterized by scanning electron microscope（SEM） and X-ray fluorescence analysis（XRF）.The results indicates that the modified electrode displays the excellent linear behavior in the examined concentration（from 25 to 200 μg·L-1）.Pb2＋ and Cu2＋ in 0.1 mol·L-1 HAc-NaAc can be detected with the sensitivity of 0.649 μA/（μg·L-1） and 0.177 μA/（μg·L-1） respectively.The corresponding detection limits are 0.26 μg·L-1 and 0.67 μg·L-1.