摘要
介绍三氯氢硅尾气处理的工艺和设备。三氯氢硅尾气(流量为3 000 m3/h)处理后排放气体中ρ(HCl)<0.1 mg/L。
The treatment process of trichlorosilane tail gas and the relative devices were introduced.After treatment the discharged gas at a flow rate of 3 000 m3/h contained HCl less than 0.1 mg/L.
出处
《氯碱工业》
CAS
2011年第12期31-33,共3页
Chlor-Alkali Industry
关键词
三氯氢硅
尾气
处理工艺
trichlorosilane
tail gas
treatment process
