摘要
本文结合了刀具 ＴｉＮ涂层多弧离子镀设备（美国多弧设备公司－Ｍｕｌｔｉ－Ａｒｃａｃｕｕｍ Ｓｙｓｔｅｍ Ｉｎｃ．生产ＭＡＶ－３２型多弧离子镀设备）实际生产需要，在工艺允许范围内改变氮气压力、工件负偏压、靶源电流和基片温度，利用电子探针、Ｘ－射线衍射仪、透射电镜和扫描电镜等分析仪器，对ＴｉＮ涂层进行了成分、相结构及显微组织分析研究，得出了比较切合实际的评价。
TiN films have been made with a multi-arc ion plating installation (made in Multi-Arc Vacuum System Inc.) from changing partial pressure of N_2, bias of substrate, target current and substrate temperature so as to getting actual producing parameters of the installation. With EPMA, X-ray diffractometer, SEM and TEM, we have also studied composition, phase structure and microstructure of the TiN films and gotten a series of useful parameters.
出处
《真空》
CAS
北大核心
1990年第2期49-59,共11页
Vacuum
