HL-1装置中的TiC涂层辐照实验研究

Experiment and Research of TiC Coating Radiation in HL-1 Plant

利用ＨＬ－１装置的等离子体辐照研究了石墨基体上的ＴｉＣ涂层。对辐照前、后 的样品进行了俄歇电子能谱（ＡＥＳ）、扫描电镜（ＳＥＭ）和Ｘ射线衍射谱（ＸＤＳ）分析，得 出：ＴｉＣ涂层内Ｔｉ、Ｃ分布比较均匀；在高功率托卡马克放电辐照下，化学腐蚀现象 较为严重，但没有改变ＴｉＣ结构相（立方ＴｉＣ）；并有一定的择优取向。同时还发现 Ｃ的优先溅射作用及 Ｔｉ向石墨基体深层扩展现象。

The TiC coating on the graphite substrate is studied with the plasma radiation in HL-l plant. Before and after radiation, the sample is analyzed with AES, SEM and XDS, the result is that the distribution of Ti and C in the TiC coating is more uniform, the chemical corrosion is more serious under the Tokomak discharge at high power, but the TiC structure does not change and there is a preferred orientation. At the meantime, there are the priority sputtering of C and the expansion into the depth of graphite substrate of Ti.