摘要
利用HL-1装置的等离子体辐照研究了石墨基体上的TiC涂层。对辐照前、后 的样品进行了俄歇电子能谱(AES)、扫描电镜(SEM)和X射线衍射谱(XDS)分析,得 出:TiC涂层内Ti、C分布比较均匀;在高功率托卡马克放电辐照下,化学腐蚀现象 较为严重,但没有改变TiC结构相(立方TiC);并有一定的择优取向。同时还发现 C的优先溅射作用及 Ti向石墨基体深层扩展现象。
The TiC coating on the graphite substrate is studied with the plasma radiation in HL-l plant. Before and after radiation, the sample is analyzed with AES, SEM and XDS, the result is that the distribution of Ti and C in the TiC coating is more uniform, the chemical corrosion is more serious under the Tokomak discharge at high power, but the TiC structure does not change and there is a preferred orientation. At the meantime, there are the priority sputtering of C and the expansion into the depth of graphite substrate of Ti.
出处
《真空》
CAS
北大核心
1990年第3期39-44,共6页
Vacuum
基金
国家自然科学基金资助项目