倒锥形磁控溅射源的设计与计算

Design and Calculation of Inversion-cone Magnetron Sputtering Source

倒锥形磁控溅射源是七十年代中期发展起来的一种新型磁控溅射源。文中在简述了 这种源的结构与工作原理的基础上，详细地论述了倒锥形磁控溅射源的靶形选择、靶面 磁场强度计算、靶与基片距离的确定、靶冷却水量的计算以及倒锥靶与水冷套的特殊结 合等问题。

The inversion-cone magnetron sputtering source is a new magnetron sputtering source in the middle of 70's on the basis of its structure and operation principle, they are described in detail how to select the target form of inversion-cone magnetron sputtering source, to calculate the field strength on the target surface, to decide the distance between target and substrate, to calculate the cooling water quantity and special bounding between inversion-cone and water-cooling jacket.