摘要
观测了化学镀Ni/Au工艺中化学镀Ni-P镀层的状态,评估了基底化学镀Ni-P镀层的P含量和Ni析出状态对引线键合性的影响。
In this paper,electroless Ni-P plating condition in electroless Au/Ni process was observed,and influence of P content and Ni deposits condition of electroless Ni-P plating sued as under layer on wire bondability was evaluated.
出处
《印制电路信息》
2012年第2期68-70,共3页
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