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退火温度对NiMn/NiFe双层膜磁性的影响

The Effect of Annealing Temperature on the Magnetic Properties of NiMn/NiFe Bilayers
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摘要 利用JDP-560C19型超高真空磁控溅射仪,在玻璃衬底上溅射制备NiMn/NiFe双层膜样品,。通过控制NiMn/NiFe双层膜退火温度改变其微观结构,研究样品磁性与退火温度的关系。研究表明,NiMn/NiFe双层膜的矫顽力和交换偏置场均随着退火温度的升高而增大,当退火温度为350℃时,矫顽力和交换偏置场都出现一个峰值,随后随着温度升高,矫顽力和交换偏置场减小。 NiMn/NiFe bilayers are prepared on glass substrates by sputtering method. Different annealing temperature is used in order to change the microstructures and magnetic properties of the samples. It is showed that the coercivity and the exchange bias field of the NiMn/NiFe bilayers are increased when the annealing temperature goes up, at T=350 ℃, a peak is observed, and then the coercivity and the exchange bias field are decreased.
作者 焦志伟 陈小军 周杰 陈苗根
机构地区 中国计量学院
出处 《台州学院学报》 2011年第6期32-35,共4页 Journal of Taizhou University
基金 浙江省自然科学基金(Y6090542) 浙江省新苗人才计划项目(2010R409022)
关键词 铁磁/反铁磁薄膜 退火温度 交换偏置 ferromagnetic/antiferromagnetic film annealing temperature exchange bias
分类号 O484.43 [理学—固体物理]
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参考文献6

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共引文献3

台州学院学报
2011年 第6期

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