沉积速率及相关工艺条件对直流反应磁控溅射制备TiO_2薄膜性质的影响

Influence of Deposition Rate and Relative Parameters on Properties of TiO_2 Thin Films Prepared by DC Reactive Magnetron Sputtering

在玻璃基板上用直流反应磁控溅射钛靶的方法制备TiO2 薄膜。在溅射总气压为 0 4Pa ,氧氩比分别为 1∶9,1∶5及 1∶3 2的情况下 ,调节溅射功率使沉积速率由 0 99nm/min变化到 12 12nm/min ,而且当基板温度为 34 0℃时 ,薄膜在可见光范围内的平均折射率基本不变 ,为 2 48± 0 0 3,而薄膜的表面形貌却有明显变化。XRD表明 ,在pO2 /pAr为 1∶9的条件下 ,薄膜中出现了TiOx(x <2 )的晶粒 ,但这对薄膜的光学性质并无影响。另外对TiO2

Titanium dioxide films have been grown on glass substrates by DC reactive magnetron sputtering.Influence of various growth parameters on the optical properties and structures of the films was studied.Our results show that the refractive index of the film,2 48±0 03,is almost independent of the deposition rate (0 99 nm/min to 12 12 nm/min) and oxygen argon ratio (1∶9,1∶5 and 1∶3.2),but the surface morphology changes distinctly.However,our X ray diffraction patterns show that if the oxygen argon ratio is 1∶9,there exist some grains of TiO x ( x <2),which has little influence on the optical properties of the film.Some preliminary results in growing multi layer optical films containing TiO 2 layers were also discussed.