用脉冲电沉积法制备两类纳米介孔氧化镍电致变色薄膜的研究

Study on two kinds of nano-mesoporous NiO electrochromic films prepared by pulse electrodeposition

采用脉冲电沉积技术在ITO导电玻璃上制备了NiO电致变色薄膜,并用X射线衍射仪、扫描电镜和能谱仪分析薄膜的结构、形貌和成份,用紫外-可见光分光光度计测试薄膜的光学性能,用循环伏安法测试薄膜的电化学性能,对比研究了Co掺杂对NiO薄膜电致变色性能的影响。结果表明Co掺杂优化了NiO薄膜表面形貌,形成了均匀分布的纳米介孔微结构,从而提高了薄膜电化学活性,同时提高了薄膜的光调制幅度。

The electrochromic NiO films were prepared on ITO conductive glass substrate by pulse electrodeposition.The microstructure,morphology and composition of NiO films were investigated by X-ray diffraction,scanning electron microscopy and energy dispersive spectrum.The optical properties of films were measured by UV-visible spectrophotometer.The electrochemical properties of films were analyzed using cyclic voltammetry.The effects of Co addition on the electrochromic properties of NiO films were studied.The results show that Co addition can optimize the surface morphology of NiO films.The homogeneous nano-mesoporous microstructure can be observed on the surface of Co-doped NiO films.Thus,the Co addition can improve the electrochemical activity and enhance the transmission modulation of NiO films.