通过过渡层改善金刚石膜和基底间的结合性能

Review on Improvement of Adhesion between Substrate and CVD Diamond Film by Using Interlayer

介绍了在金刚石膜和基底间通过施加过渡层以改善金刚石膜与基底间的结合性能的研究成果。金刚石膜可以通过过渡层沉积于多种基底上，如Ｓｉ、ＳｉＯ２ 、陶瓷（ＳｉＣ，Ａｌ２Ｏ３） 、钢及硬质合金基底等。过渡层有单层（ 如ＤＬＣ、Ｃ６０ 、ＹＺｒＯ２ 、ＣＮ 膜、ＴｉＣ或ＴｉＮ） 和多层（ 如Ｍｏ／Ｎｉ、Ｍｏ／ＴｉＮ 或Ｂ／ＴｉＢ２／Ｂ 等） 之分，根据金刚石、过渡层及基底的晶格匹配性和热学匹配性，对于不同的基底应选择不同的过渡层。

Achievements on improving the adhesion strength of diamond film on substrate by introducing interlayer between them is reviewed in the paper. Diamond film can be deposited on many substrates by using interlayer such as Si, SiO 2, SiC, Al 2O 3, Fe, WC Co, and so on. The interlayer can be in form of monolayer as well as multilayer, such as DLC, C 60 , Y ZrO 2, C N, TiC or TiN; Mo/Ni, Mo/TiN, B/TiB 2/B. Different interlayer should be chosen with different substrate according to the lattice parameter and thermal coefficient to meet the demand of lattice and thermal matching.